PEODUCT
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R2R Coating System
MENTO-M Series
MENTO-M series is a R2R coating equipment composed of separate vacuum chamber according to each function to enhance the continuous coating of the multi-layered thin film and also to enhance the efficiency in the product manufacturing process. The vacuum chamber is basically composed of the unwinder, process and rewinder, and depending on the equipment requirement for product manufacture, the process section can be expanded into multi-process vacuum chamber.
Application Products
The MENTO-M series of Advanced Technologies Co., Ltd separates the metal material or the reactive material to enable continuous coating of hetero-material, and can be applied to various application products.
| IT field | IM-ITO and metal mesh touch film, bezel metallization of display, barrier film |
| Energy field | IR protective window film, thin film solar cell, Li secondary battery |
| Electronic device field | High quality FCCL, EMI shielding film |
| Other industrial field | Multi-layered thin film coating based exterior application field of the interior |
System Specifications
The R2R coating equipment manufacturing method of Advanced Technologies Co., Ltd is based on the customer request specification to manufacture the product in optimum efficiency. Based on this factor, the common specifications below are reflected to manufacture and supply the equipment..
| CChamber type | Unwinder | Rectangular Type | ||
| Process | Circular Type | |||
| Rewinder | Rectangular Type | |||
| Application material | PET, PI film, other flexible polymer film, metal film | |||
| Core size | 3 inch, 6 inch | |||
| Material specification | Width | Length | Thickness (Polymer) | Thickness (Metal) |
| Max. 1,350㎜ | Max.ø550㎜ | Min. 23㎛ | 100㎛ ~ 400㎛ | |
| Winding speed | Max. 20m/min | |||
| Pre-treatment method | Pre-heater | Max. 200℃ | ||
| Plasma surface treatment | DC, Pulse DC, Linear Ion beam Source | |||
| Coating source | Sputter Source | Single Planar Cathode / Dual Planar Cathode Single Rotary Cathode / Dual Rotary Cathode | ||
| Thermal Source | Crucible, E-Beam | |||
| Plasma assist source | Plasma Assist Source | |||
| Coating material | Metal material | Al, Ti, Cr, Cu, NiCr, Ni, Ag, other metal material | ||
| Reactive material | TiO2, Nb2O5, SiO2, TIO, SiAlOx, MoOx, other nitride / oxide material | |||
| Power Supply | DC, Pulse DC, MF | |||
| Pump | Selection of the pump proper to the equipment specification | |||
| Measuring instrument | Sheet resistance, optic (Transmittance, reflectance, color-difference meter), plasma emission | |||
| Web align | EPC Module | |||